Development of FreePDK: An Open-Source Process Design Kit for Advanced Technology Nodes
- Speaker(s): Kirti Bhanushali
- email: knbhanus@ncsu.edu
- other information: xxx
Slides
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Abstract
The design rules, layout guidelines and evolution for the open source predictive process design kit (PDK) FreePDK15 is discussed. Additional design rules are introduced considering process variability, and challenges involved in fabrication beyond 20nm. Particularly, double patterning lithography is assumed and a unique set of design rules are developed for critical dimensions. In order to improve the FinFET layout density, Middle-of-line local interconnect layers are implemented for the FinFET layout. The rules are further validated by running Calibre design-rule checks on Virtuoso layout of an Inverter and NAND4 cells. As part of the validation process, the area of a FreePDK15 inverter was compared to the area of an inverter in 45nm bulk MOS process and the ratio was found to be 1:6. This kit primarily aims to support introduction of sub-20nm FinFET devices into research and universities.
Software
General information
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- Main documentation website: https://www.eda.ncsu.edu/wiki/FreePDK
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Roadmap
- The software wishes to interface with the following tools: XXX, YYY
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